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LPCVD, PECVD Systems for Thin Film Deposition
Ar Plasma Torch in Glove Box
Contact Angle Measuring Unit
Equipments for
Thin Film Technologies


We custom-design and build laboratory scale equipments for thin film deposition and characterization.

The equipments for thin film deposition typically consist of a reaction chamber (heated, hot wall glass or quartz tube or cooled metal construction), a vacuum system and a gas, liquid feeding system. The vacuum and gas delivery system can be controlled manually with ON/OFF valves and rotameters or automatically via PC computer with pneumatic driven valves and electronic Mass Flow Controllers.
The PC computer has a multi-port A/D,D/A card and a software developed specially for controlling gas and vacuum systems. Some of the equipments are controlled by PLC.


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